FIB-SEM (Focused Ion Beam SEM) | High Precision Nano-Analysis
The CIQTEK DB550 is a high-performance Focused Ion Beam SEM (FIB) system that goes beyond traditional electron microscopy by integrating ion beam processing and nano-analysis capabilities
Need a powerful FIB-SEM for your research or manufacturing process? Request a quote today.
DB550 FIB-SEM Microscope Key Features
The DB550 FIB-SEM delivers unparalleled resolution and precision with its integrated ion and electron beam technology, making it an essential tool for nanotechnology research and industrial applications.
Reduces spatial charging effects, enhancing low-voltage imaging performance.
Features Ga+ liquid metal ion source with nano fabrication precision down to 3nm resolution.
Three-axis system with 10nm stepper motor accuracy for advanced specimen positioning.
Precisely delivers gases for material modification.
Supports up to 8-inch samples, reducing contamination and improving sample handling efficiency.
Includes Everhart-Thornley Detector (ETD), In-Lens Detector, Back-Scattered Electron Detector (EBSD), and STEM Detector for versatile material characterization.
Optimized for non-conductive and sensitive materials, improving imaging contrast and clarity.
Designed for semiconductors, energy research, materials science, and nanotechnology fabrication.
Looking to compare FIB-SEM microscope models? Contact us for pricing and specifications.
DB550 Focused Ion Beam SEM Performance Advantages
Delivering high-precision nano-fabrication and imaging, the DB550 FIB-SEM Microscope is an essential tool for semiconductor failure analysis, cross-sectioning, and advanced materials research.
- Unmatched Nano-Scale Imaging & Fabrication – Combines high-resolution electron imaging with ion beam milling for precise material modification.
- Cross-Sectioning & TEM Sample Preparation – Enables ultra-thin fabrication for Transmission Electron Microscopy (TEM)
- High-Resolution Imaging Across Multiple Voltage Ranges
- Reduced Spatial Charging Effects – Super tunnel electron optics minimize charging, improving low-voltage imaging contrast.
- Improved Lens Aberration Correction – Enhances clarity and resolution across different imaging modes.
- All-in-One Nano-Analysis & Fabrication Workstation – Integrates gas injection, ion beam milling, and imaging for advanced research.
- Advanced Semiconductor Failure Analysis – Supports defect inspection, circuit modification, and material etching.
Software Capabilities & Accessories
The DB550 FIB-SEM features a powerful software suite to streamline research and enhance nano-analysis capabilities.
- User-Friendly GUI – Intuitive interface for controlling FIB-SEM functions.
- Specimen Characterization Tools – Comprehensive analysis tools for material science and semiconductor research.
- Cross-Section Analysis Software – Provides detailed structural visualization and precision sectioning controls.
- Compatibility with Multiple Signal Detection Modes
- Micro/Nano Fabrication Support – Includes customizable workflow automation for nano-manufacturing applications.
- Software Development Kit (SDK) Available – Enable custom integration and automation for specialized research workflows.
- Optional Image Post-Processing Tools – Enhances contrast, noise reduction, and feature extraction for high-precision imaging.
