FIB-SEM (Focused Ion Beam SEM) | High Precision Nano-Analysis
The CIQTEK DB550 is a high-performance Focused Ion Beam SEM (FIB) system that goes beyond traditional electron microscopy by integrating ion beam processing and nano-analysis capabilities
Need a powerful FIB-SEM for your research or manufacturing process? Request a quote today.
DB550 FIB-SEM Microscope Key Features
The DB550 FIB-SEM delivers unparalleled resolution and precision with its integrated ion and electron beam technology, making it an essential tool for nanotechnology research and industrial applications.
- Super Tunnel Electron Optics Technology – Reduces spatial charging effects, enhancing low-voltage imaging performance.
- High-Precision Gallium Ion Beam – Features Ga+ liquid metal ion source with nano fabrication precision down to 3 nm resolution.
- Integrated Nano-Manipulator – Three-axis system with 10 nm stepper motor accuracy for advanced specimen positioning.
- Comprehensive Gas Injection System – Precisely delivers gases for material modification.
- Specimen Exchange Loadlock – Supports up to 8-inch samples, reducing contamination and improving sample handling efficiency.
- Multi-Mode Advanced Imaging Detectors – Includes Everhart-Thornley Detector (ETD), In-Lens Detector, Back-Scattered Electron Detector (BSED), and STEM Detector for versatile material characterization.
- Low-Voltage, High-Resolution Imaging – Optimized for non-conductive and sensitive materials, improving imaging contrast and clarity.
- Cross-Industry Application Versatility – Designed for semiconductors, energy research, materials science, and nanotechnology fabrication.
Looking to compare FIB-SEM microscope models? Contact us for pricing and specifications.
DB550 Focused Ion Beam SEM Performance Advantages
Delivering high-precision nano-fabrication and imaging, the DB550 FIB-SEM Microscope is an essential tool for semiconductor failure analysis, cross-sectioning, and advanced materials research.
- Unmatched Nano-Scale Imaging & Fabrication – Combines high-resolution electron imaging with ion beam milling for precise material modification.
- Cross-Sectioning & TEM Sample Preparation – Enables ultra-thin fabrication for Transmission Electron Microscopy (TEM)
- High-Resolution Imaging Across Multiple Voltage Ranges
- Reduced Spatial Charging Effects – Super tunnel electron optics minimize charging, improving low-voltage imaging contrast.
- Improved Lens Aberration Correction – Enhances clarity and resolution across different imaging modes.
- All-in-One Nano-Analysis & Fabrication Workstation – Integrates gas injection, ion beam milling, and imaging for advanced research.
- Advanced Semiconductor Failure Analysis – Supports defect inspection, circuit modification, and material etching.
Software Capabilities & Accessories
The DB550 FIB-SEM features a powerful software suite to streamline research and enhance nano-analysis capabilities.
- User-Friendly GUI – Intuitive interface for controlling FIB-SEM functions.
- Specimen Characterization Tools – Comprehensive analysis tools for material science and semiconductor research.
- Cross-Section Analysis Software – Provides detailed structural visualization and precision sectioning controls.
- Compatibility with Multiple Signal Detection Modes
- Micro/Nano Fabrication Support – Includes customizable workflow automation for nano-manufacturing applications.
- Software Development Kit (SDK) Available – Enable custom integration and automation for specialized research workflows.
- Optional Image Post-Processing Tools – Enhances contrast, noise reduction, and feature extraction for high-precision imaging.
